7 results
Preparation of iridium metal films by spray chemical vapor deposition
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- Journal:
- MRS Advances / Volume 5 / Issue 31-32 / 2020
- Published online by Cambridge University Press:
- 04 February 2020, pp. 1681-1685
- Print publication:
- 2020
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Incubation Time Free CVD-TiO2 Film Preparation Using Novel Precursor of Ti-DOT
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1288 / 2011
- Published online by Cambridge University Press:
- 23 March 2011, mrsf10-1288-g06-38
- Print publication:
- 2011
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Ligand Structure Effect on A Divalent Ruthenium Precursor for MOCVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1155 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1155-C09-11
- Print publication:
- 2009
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A Novel MO Precursor for Metal Tantalum and Tantalum Nitride Film
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- Journal:
- MRS Online Proceedings Library Archive / Volume 914 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0914-F09-03
- Print publication:
- 2006
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A Novel Iridium Precursor for MOCVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 784 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, C3.30
- Print publication:
- 2003
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Property Improvement of Mocvd-Pzt Films Deposited Below 400 °C
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- Journal:
- MRS Online Proceedings Library Archive / Volume 784 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, C4.3
- Print publication:
- 2003
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A Novel Ruthenium Precursor for MOCVD without Seed Ruthenium Layer
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- Journal:
- MRS Online Proceedings Library Archive / Volume 748 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, U12.7
- Print publication:
- 2002
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